• DocumentCode
    3328065
  • Title

    Optical Properties of Ge and Si Embedded Structure from Ab Initio Calculation

  • Author

    Zhang Min-gang ; Wang Bing-jie ; Chai Yue-sheng

  • Author_Institution
    Coll. of Mater. Sci. & Eng., Taiyuan Univ. of Sci. & Technol., Taiyuan, China
  • fYear
    2011
  • fDate
    16-18 May 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    To investigate the relation between optical property and size of the nano structure, the band structures, density of states, and optical properties of series nano structures embedded in SiO2 were calculated using the density functional theory-plane waves(DFT-PW) of first-principles method. The results show, the intermediate levels of Ge and Si nanostructure are at about 3.3 eV and 4.3 eV above Fermi level respectively, with the dimension of nanocrystal embedded in SiO2 increasing, the absorption edge firstly move to the red side, then move to the blue side. It is indicate that the visible luminescence of nanometer-sized Si and Ge structures mostly come from the defect of its interface, the minimum size of Ge and Si nanocrystal embedded in SiO2 that can use quantum-confined model does exist. These conclusions provide proof of improving optical properties of materials and researching luminescence mechanism deeply.
  • Keywords
    APW calculations; Fermi level; ab initio calculations; band structure; density functional theory; elemental semiconductors; germanium; nanostructured materials; photoluminescence; silicon; silicon compounds; visible spectra; Fermi level; Ge-SiO2; Si-SiO2; ab initio calculation; absorption edge; band structure; density functional theory; density of states; nanostructured materials; plane wave method; quantum-confined model; visible luminescence; Absorption; Adaptive optics; Atom optics; Luminescence; Nanocrystals; Optical device fabrication; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronics (SOPO), 2011 Symposium on
  • Conference_Location
    Wuhan
  • ISSN
    2156-8464
  • Print_ISBN
    978-1-4244-6555-2
  • Type

    conf

  • DOI
    10.1109/SOPO.2011.5780598
  • Filename
    5780598