• DocumentCode
    3328159
  • Title

    Opportunities and challenges of working in the THz region of the electromagnetic spectrum: A critical analysis of applications and sources

  • Author

    Armstrong, Carter M.

  • Author_Institution
    Electron Devices, L-3 Commun., San Carlos, CA, USA
  • fYear
    2010
  • fDate
    20-24 June 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. With the turn of the century came a worldwide resurgence in interest in all things THz - review papers were written, popular press articles published, and numerous technology reviews held. To that end, the author had the opportunity, a few years ago, to co-chair a review on the state of compact THz source technology for the DoD. THz was taken in the review as covering the classical submillimeter frequency band from 300 GHz to 3 THz, with source technologies in the general 100 μW to 1W average power range being the primary focus.During the preparation of the final report it became apparent to the author that a rudimentary analysis of applications and device physics was needed to help put the THz technical pursuit into proper context to help elucidate, as it might be, the opportunities and challenges of working in this demanding region of the electromagnetic spectrum. The main results and conclusions of the study will be presented in this talk.
  • Keywords
    plasma applications; plasma devices; plasma sources; THz region; classical submillimeter frequency band; compact THz source technology; critical analysis; electromagnetic spectrum; frequency 300 GHz to 3 THz; power 100 muW to 1 W; rudimentary analysis; Communication industry; Electromagnetic analysis; Electromagnetic spectrum; Electron devices; Frequency; Paper technology; Physics; Submillimeter wave technology; US Government;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2010 Abstracts IEEE International Conference on
  • Conference_Location
    Norfolk, VA
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-5474-7
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2010.5533944
  • Filename
    5533944