Title :
Full-Field Thickness Measuring of Photoresist on Spherical Surface in Lithography Techniques
Author :
Jingyu Liang ; Yiyong Liang
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Abstract :
In this paper, we introduce a method for measuring the thickness of photoresist on the surface of full-field spherical substate. This method is implemented by measuring the reflection power of incident light. Compared with other metrology, our method has many features such as real-time and compact optical setup.
Keywords :
lithography; optical variables measurement; photoresists; reflectivity; thickness measurement; compact optical setup; full-field spherical substate; full-field thickness measurement; lithography; photoresist; real-time setup; reflection measuring; Coatings; Lithography; Optical reflection; Resists; Substrates; Thickness measurement;
Conference_Titel :
Photonics and Optoelectronics (SOPO), 2011 Symposium on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-6555-2
DOI :
10.1109/SOPO.2011.5780647
