Correction of near-field effects in phased array element pattern measurements

Differences in phased array element patterns measured in the near-field and far-field are shown to be due to attenuation and distortion of mutual coupling and edge diffraction effects in the near-field. A technique based on the virtual array concept is presented to correct the near-field element patterns. The technique is also used to determine a lower bound on phased array sidelobe performance achievable with adaptive calibrations.