Title :
Single crystal silicon four-terminal nano-wire shear stress gauge for nano mechanical sensors
Author :
Toriyama, Toshiyuki ; Sugiyama, Susumu
Author_Institution :
New Energy & Ind. Technol. Dev. Organ., Tokyo, Japan
Abstract :
P-type single crystal silicon four-terminal nanowire shear stress gauge (Si FSSG) was fabricated by electron-beam direct writing. The piezoresistance was investigated in order to demonstrate the usefulness of these sensing elements as mechanical sensors. The shear piezoresistance coefficient π44 was found to be 77.4×10-11 Pa-1 at Ns=9-1019 cm-3. This value was 54.8 % larger than the value obtained from p+ diffused piezoresistors, which are used in conventional mechanical sensors.
Keywords :
elemental semiconductors; nanotechnology; piezoresistance; silicon; stress measurement; Si; electron-beam direct writing; four-terminal nanowire shear stress gauge; nanomechanical sensors; p-type single crystal; shear piezoresistance coefficient; Crystalline materials; Fabrication; Impurities; Mechanical sensors; Piezoresistance; Silicon; Springs; Stress; Voltage; Wire;
Conference_Titel :
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
Print_ISBN :
0-7803-7744-3
DOI :
10.1109/MEMSYS.2003.1189684