• DocumentCode
    3331537
  • Title

    AC driven low pressure plasam reactor with annular shaped electrodes for abatement of pollutants emitted from semiconductor processing

  • Author

    Min Hur ; Jae Ok Lee ; Min Suk Cha ; Young Hoon Song

  • Author_Institution
    Environ. Syst. Res. Div., Korea Inst. Of Machinery & Mater., Daejeon, South Korea
  • fYear
    2010
  • fDate
    20-24 June 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Abatement of air pollutants released from semiconductor industries has received attention due to the increasingly stricter regulation on their emission. In order to reduce these pollutants, we have developed an alternative current (AC) driven plasma reactor, characterized by multiple annular shaped electrodes attached to the outer surface of a quartz tube. At a low pressure regime, the abatement experiment is performed with respect to tetrakis-ethylmethylamino-zirconium (TEMAZ), representative pollutants widely used in semiconductor processes. The destruction rates of TEMAZ are compared using a Fourier transform infrared (FTIR) spectrometer by varying the applied voltage and the driving frequency. By optical emission spectroscopy (OES), the spatial distributions of various spectra emitted from glow discharge are compared before and after the TEMAZ injection, and then not only the discharge characteristics but also the influence of residence time is discussed using the emission results.
  • Keywords
    air pollution control; glow discharges; organic compounds; plasma diagnostics; plasma pressure; AC driven low pressure plasam reactor; Fourier transform infrared spectrometer; abatement experiment; air pollutant abatement; destruction rates; discharge characteristics; glow discharge; low pressure regime; multiple annular shaped electrodes; optical emission spectroscopy; quartz tube surface; semiconductor industry; semiconductor processing; spectral emission; tetrakis-ethylmethylamino-zirconium; Air pollution; Electrodes; Electronics industry; Environmentally friendly manufacturing techniques; Inductors; Industrial pollution; Infrared spectra; Plasma applications; Plasma materials processing; Spectroscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2010 Abstracts IEEE International Conference on
  • Conference_Location
    Norfolk, VA
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-5474-7
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2010.5534130
  • Filename
    5534130