DocumentCode :
3331537
Title :
AC driven low pressure plasam reactor with annular shaped electrodes for abatement of pollutants emitted from semiconductor processing
Author :
Min Hur ; Jae Ok Lee ; Min Suk Cha ; Young Hoon Song
Author_Institution :
Environ. Syst. Res. Div., Korea Inst. Of Machinery & Mater., Daejeon, South Korea
fYear :
2010
fDate :
20-24 June 2010
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Abatement of air pollutants released from semiconductor industries has received attention due to the increasingly stricter regulation on their emission. In order to reduce these pollutants, we have developed an alternative current (AC) driven plasma reactor, characterized by multiple annular shaped electrodes attached to the outer surface of a quartz tube. At a low pressure regime, the abatement experiment is performed with respect to tetrakis-ethylmethylamino-zirconium (TEMAZ), representative pollutants widely used in semiconductor processes. The destruction rates of TEMAZ are compared using a Fourier transform infrared (FTIR) spectrometer by varying the applied voltage and the driving frequency. By optical emission spectroscopy (OES), the spatial distributions of various spectra emitted from glow discharge are compared before and after the TEMAZ injection, and then not only the discharge characteristics but also the influence of residence time is discussed using the emission results.
Keywords :
air pollution control; glow discharges; organic compounds; plasma diagnostics; plasma pressure; AC driven low pressure plasam reactor; Fourier transform infrared spectrometer; abatement experiment; air pollutant abatement; destruction rates; discharge characteristics; glow discharge; low pressure regime; multiple annular shaped electrodes; optical emission spectroscopy; quartz tube surface; semiconductor industry; semiconductor processing; spectral emission; tetrakis-ethylmethylamino-zirconium; Air pollution; Electrodes; Electronics industry; Environmentally friendly manufacturing techniques; Inductors; Industrial pollution; Infrared spectra; Plasma applications; Plasma materials processing; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
ISSN :
0730-9244
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2010.5534130
Filename :
5534130
Link To Document :
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