Gas phase study of a 2-chloro-p-xylene discharge

Summary for only given. Parylene C is a widely used polymer when a high-quality protective layer is needed. It has excellent bulk properties that make it a popular choice for a wide array of areas that includes dielectric applications, biomedicine and micro-electromechanical systems (MEMS). Nonetheless, under traditional deposition its poor adhesion to a broad range of substrates remains a main concern. In comparison, plasma polymerization offers improved adhesion with retention of monomer functionality. Unfortunately, most studies on plasma polymerization of parylene C focus only in the films characteristics. In the work reported here we use a wide set of data to predict the film growth mechanisms during plasma polymerization of parylene C. Specifically, we examine plasma gas phase chemistry in a 2-Chloro-p-xylene discharge using Fourier-Transform Infrared Spectroscopy. In addition, we make use of a WISE probe to measure electron temperature and density under the same conditions. Finally, we make use of an e-beam probe to examine exhaust gas chemistry.