Title :
Fluorination of polypropylene by remote inductively coupled plasmas sustained in Ar/F2 and Ar/NF3 gas mixtures
Author :
Song, Sang-Heon ; Yang, Yang ; Strobel, Mark ; Kirk, Seth ; Kushner, Mark J.
Author_Institution :
Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
Summary form only given. The surface energy and adhesion properties of commodity polymers such as polypropylene (PP) can be modified by functionalization of the surface by plasma-generated radicals and ions. For example affixing fluorine to the surface in a low temperature plasma lowers surface energy and increases hydrophobicity. The F atoms produced in the plasma both abstract H atoms from and adhere to the surface. In such plasma fluorination, the surface is also subject to energetic ion and photon fluxes. Another strategy is the use of a remote plasma to produce a flow of fluorine radicals which are injected into a reactor where the PP sheets are processed. For example, a remote inductively coupled plasma (TCP) sustained in mixtures containing F2 or NF3 produces plumes of F and NFX radicals which functionalize the PP. In these systems, the PP is subject to only neutral species and so may have different surface properties than PP immersed in a plasma.
Keywords :
argon; fluorine; gas mixtures; nitrogen compounds; plasma boundary layers; plasma flow; plasma simulation; plasma temperature; polymers; Ar-F2; Ar-NF3; adhesion properties; energetic ion flux; energetic photon flux; fluorine radical flow; gas mixture; hydrophobicity; low temperature plasma; plasma fluorination; plasma simulation; plasma-generated ion; plasma-generated radical; polypropylene fluorination; remote inductively coupled plasma; surface energy; Adhesives; Argon; Atomic measurements; Hydrodynamics; Inductors; Kirk field collapse effect; Plasma properties; Plasma simulation; Plasma temperature; Polymers;
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2010.5534152