DocumentCode :
3332040
Title :
Layer removal from triso-coated particles with a cold plasma
Author :
Van der Walt, Izak J. ; Nel, Johann T. ; Crouse, Philip L.
Author_Institution :
South African Nucl. Energy Corp. Ltd., Pelindaba, South Africa
fYear :
2010
fDate :
20-24 June 2010
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Generation IV nuclear reactors generally use small spherical UO2 particles that are coated with a multitude of layers including graphite and SiC. These particles are called TRISO-particles. During the manufacturing process some of the particles are scrapped because of defective layer formation or layer densities and are therefore outside the prescribed specifications. In order to recover the uranium contained inside such particles, a process was developed where the carbon and SiC layers was removed by oxidizing and etching it in a non-thermal plasma.
Keywords :
carbon; plasma materials processing; silicon compounds; sputter etching; uranium compounds; C; SiC; TRISO-coated particles; UO2; cold plasma; defective layer formation; generation IV nuclear reactor; layer density; manufacturing process; nonthermal plasma; plasma etching; spherical particles; Africa; Chemical engineering; Etching; Manufacturing processes; Nuclear and plasma sciences; Nuclear power generation; Plasma applications; Plasma chemistry; Plasma density; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
ISSN :
0730-9244
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2010.5534157
Filename :
5534157
Link To Document :
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