• DocumentCode
    3332040
  • Title

    Layer removal from triso-coated particles with a cold plasma

  • Author

    Van der Walt, Izak J. ; Nel, Johann T. ; Crouse, Philip L.

  • Author_Institution
    South African Nucl. Energy Corp. Ltd., Pelindaba, South Africa
  • fYear
    2010
  • fDate
    20-24 June 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Generation IV nuclear reactors generally use small spherical UO2 particles that are coated with a multitude of layers including graphite and SiC. These particles are called TRISO-particles. During the manufacturing process some of the particles are scrapped because of defective layer formation or layer densities and are therefore outside the prescribed specifications. In order to recover the uranium contained inside such particles, a process was developed where the carbon and SiC layers was removed by oxidizing and etching it in a non-thermal plasma.
  • Keywords
    carbon; plasma materials processing; silicon compounds; sputter etching; uranium compounds; C; SiC; TRISO-coated particles; UO2; cold plasma; defective layer formation; generation IV nuclear reactor; layer density; manufacturing process; nonthermal plasma; plasma etching; spherical particles; Africa; Chemical engineering; Etching; Manufacturing processes; Nuclear and plasma sciences; Nuclear power generation; Plasma applications; Plasma chemistry; Plasma density; Silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2010 Abstracts IEEE International Conference on
  • Conference_Location
    Norfolk, VA
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-5474-7
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2010.5534157
  • Filename
    5534157