Title :
Temperature of micro-particles in a low-pressure rf-discharge
Author :
Maurer, H.R. ; Kersten, H. ; Basner, R.
Author_Institution :
IEAP, Univ. of Kiel, Kiel, Germany
Abstract :
Summary form only given. The surface temperature of substrates is a fundamental parameter in technical plasmas used for deposition of layers or modification of surface properties. It is determined by different energy fluxes between the plasma and the substrate, whose composition is addicted to physical and chemical reaction rates1. In this work, micro-disperse phosphor particles are applied as temperature probes, feasible for the determination of the particle temperature by means of optical techniques2. These particles are confined in the sheath of a capacitively coupled rf-plasma, and their externally excited luminescence is recorded spectroscopically and evaluated by a comparison to calibration measurements. Results for the particle temperatures in different plasma conditions in Argon are presented, as well as in mixtures with molecular gases. The particle temperatures are discussed with respect to the particular plasma-parameters and appearing surface reactions.
Keywords :
argon; gas mixtures; high-frequency discharges; plasma chemistry; plasma pressure; plasma probes; plasma sheaths; plasma temperature; Ar; capacitively coupled rf-plasma sheath; chemical reaction rates; energy flux; externally excited luminescence; layer deposition; low-pressure rf-discharge; microdisperse phosphor particles; microparticle temperature; molecular gas mixture; optical techniques; plasma-parameter; surface temperature; temperature probes; Chemicals; Luminescence; Optical recording; Phosphors; Plasma chemistry; Plasma confinement; Plasma measurements; Plasma properties; Plasma temperature; Probes;
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2010.5534171
