DocumentCode :
3332316
Title :
A novel fabrication of in-channel 3-D micromesh structure using maskless multi-angle exposure and its microfilter application
Author :
Sato, Hironobu ; Kakinuma, Takayuki ; Go, Jeung Sang ; Shoji, Shuichi
Author_Institution :
Dept. of Electron., Inf. & Commun. Eng., Waseda Univ., Tokyo, Japan
fYear :
2003
fDate :
19-23 Jan. 2003
Firstpage :
223
Lastpage :
226
Abstract :
This paper presents a novel fabrication method of in-channel three-dimensional micromesh structures using the conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Numbers of exposure and irradiation angle decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis system (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
Keywords :
filters; microfluidics; micromechanical devices; ultraviolet lithography; μTAS; SU-8 coated metal-patterned glass substrate; UV light exposure; flow resistance; in-channel 3-D micromesh structure; maskless multi-angle exposure; micro total analysis system; microfilter; micromesh-inserted microchannel structures; photolithography; Electrical resistance measurement; Fabrication; Filtering; Fluid flow measurement; Glass; Hydrodynamics; Lithography; Microchannel; Microfiltration; Shape;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-7744-3
Type :
conf
DOI :
10.1109/MEMSYS.2003.1189726
Filename :
1189726
Link To Document :
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