Title :
OH radical generation in a discharge plasma observed by a LIF method
Author :
Ono, Ryo ; Oda, Tetsuji
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Japan
Abstract :
Hydroxyl radicals generated by a pulsed arc discharge were measured by laser-induced fluorescence (LIF) with a tunable KrF excimer laser. Although the KrF laser had a number of excitation lines of O2 and NO, it was confirmed that the KrF laser could excite OH without interference of LIF signal from another molecule. The time evolution of OH density in the post-discharge region showed oxygen had the effect of increasing OH and shortened the O-H lifetime. That indicates O(1D) radical as well as electron reacted with H 2O to yield OH radicals and that OH reacted with products made by oxygen such as O or O3. The oxidation reaction of NO with OH was experimentally demonstrated. It was found that NO accelerated OH decay rate. The OH density was calibrated by calculating absolute density of OH
Keywords :
arcs (electric); excimer lasers; fluorescence; free radicals; measurement by laser beam; photoluminescence; plasma chemistry; H2O; KrF; NO; NO excitation lines; O2; O2 excitation lines; OH; OH decay rate acceleration; OH density; absolute density calculation; discharge plasma; hydroxyl radicals generation; laser-induced fluorescence; nonthermal plasma; pollutant gases decomposition; post-discharge region; pulsed arc discharge; time evolution; tunable KrF excimer laser; Arc discharges; Electrons; Fluorescence; Interference; Laser excitation; Measurement by laser beam; Optical pulse generation; Plasma measurements; Pulse measurements; Tunable circuits and devices;
Conference_Titel :
Industry Applications Conference, 1999. Thirty-Fourth IAS Annual Meeting. Conference Record of the 1999 IEEE
Conference_Location :
Phoenix, AZ
Print_ISBN :
0-7803-5589-X
DOI :
10.1109/IAS.1999.805934
