DocumentCode :
3332862
Title :
Silicon micromachined gas chromatography system
Author :
Kolesar, Edward S., Jr. ; Reston, Rocky R.
Author_Institution :
Dept. of Eng., Texas Christian Univ., Fort Worth, TX, USA
fYear :
1997
fDate :
8-10 Oct 1997
Firstpage :
117
Lastpage :
125
Abstract :
A miniature gas chromatography (GC) system has been designed and fabricated using silicon micromachining and integrated circuit (IC) processing techniques. The silicon micromachined gas chromatography system (SMGCS) is composed of a miniature sample injector that incorporates a 10 μl sample loop; a 0.9-m long, rectangular-shaped (300 μm width and 10 μm height) capillary column coated with a 0.2-μm thick copper phthalocyanine (CuPc) stationary-phase; and a dual-detector scheme based upon a CuPc-coated chemiresistor and a commercially available, 125-μm diameter thermal conductivity detector (TCD) bead. Silicon micromachining was employed to fabricate the interface between the sample injector and the GC column, the column itself, and the dual-detector cavity. A novel IC thin-film processing technique was developed to sublime the CuPc stationary-phase coating on the column walls that were micromachined in the host silicon wafer substrate and Pyrex cover plate, which were then electrostatically bonded together. The SMGCS can separate binary gas mixtures composed of parts per-million (ppm) concentrations of ammonia (NH3) and nitrogen dioxide (NO2) when isothermally operated (55-80°C). With a helium carrier gas and nitrogen diluent, a 10 μl sample volume containing ammonia and nitrogen dioxide injected at 40 psi (2.8×105 Pa) can be separated in less than 30 minutes
Keywords :
chromatography; elemental semiconductors; micromachining; silicon; 55 to 80 C; NH3; NO2; Pyrex cover plate; Si; binary gas mixture; capillary column; chemiresistor; copper phthalocyanine stationary-phase coating; dual-detector cavity; electrostatic bonding; integrated circuit thin-film processing; isothermal separation; sample injector; silicon micromachined gas chromatography system; silicon micromachining; silicon wafer substrate; sublimation; thermal conductivity detector; Coatings; Copper; Detectors; Gas chromatography; Micromachining; Nitrogen; Semiconductor thin films; Silicon; Substrates; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Innovative Systems in Silicon, 1997. Proceedings., Second Annual IEEE International Conference on
Conference_Location :
Austin, TX
ISSN :
1094-7116
Print_ISBN :
0-7803-4276-3
Type :
conf
DOI :
10.1109/ICISS.1997.630252
Filename :
630252
Link To Document :
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