DocumentCode :
3333311
Title :
Electron Beam Lithography
Author :
Ozdemir, Faik S.
Author_Institution :
Hughes Research Laboratories, Malibu, CA
fYear :
1979
fDate :
25-27 June 1979
Firstpage :
383
Lastpage :
391
Abstract :
Electron beam lithography is a rapidly maturing technology that has opened the realm of submicron design to the semiconductor device and circuit designer. This improved pattern resolution has already yielded devices and circuits exhibiting higher density, higher operating frequency, and lower operating power than has been possible with other lithography methods. This paper discusses electron beam lithography and the devices and circuits that have been fabricated with this technology.
Keywords :
Apertures; Circuits; Design automation; Electron beams; Fabrication; Frequency; Laboratories; Lenses; Lithography; Semiconductor devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation, 1979. 16th Conference on
Type :
conf
DOI :
10.1109/DAC.1979.1600141
Filename :
1600141
Link To Document :
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