• DocumentCode
    3333608
  • Title

    High resolution PCB field intensity by near aperture field transformation

  • Author

    Dau-Chyrh Chang ; Yi-Jhen Li ; Ti-Han Pei

  • Author_Institution
    Commun. Res. Center, Oriental Inst. of Technol., Taipei, Taiwan
  • fYear
    2011
  • fDate
    8-10 Aug. 2011
  • Firstpage
    180
  • Lastpage
    185
  • Abstract
    Most of RE (radiation emission) from PCB (print circuit board) will cause the system fail to pass the EMI regulation and degrade the sensitivity in communication system. Since the size of cellular communication system is smaller and smaller, the sensitivity of system is degraded by near field EMI. This paper proposes a technique to predict the high resolution surface current density on PCB by planar aperture field above the PCB. The GEMS which is based on the FDTD (finite difference time domain) is used to simulate the current density on the PCB. The aperture field of two kinds of PCB antenna with dual bands are measured by planar near field scanner. The measured data is transformed to the surface of PCB to get the surface current density on the PCB. The results of PCB current density from both measurement and simulation are quite similar.
  • Keywords
    cellular radio; current density; electromagnetic interference; finite difference time-domain analysis; multifrequency antennas; printed circuits; EMI regulation; FDTD; GEMS; PCB antenna; RE; cellular communication system; dual band antenna; finite difference time domain; high-resolution PCB field intensity; high-resolution surface current density; near-aperture field transformation; near-field EMI; planar aperture field; planar near-field scanner; print circuit board; radiation emission; Antenna measurements; Apertures; Communication systems; Current density; Density measurement; Electromagnetic interference; BER; EMI; FDTD; GEMS; RE; TIS; TRP;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electromagnetics, Applications and Student Innovation (iWEM), 2011 IEEE International Workshop on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-61284-462-6
  • Electronic_ISBN
    978-1-61284-461-9
  • Type

    conf

  • DOI
    10.1109/iWEM.2011.6021456
  • Filename
    6021456