• DocumentCode
    3333794
  • Title

    3D fabrication using deep X-ray mask with integrated micro-actuator

  • Author

    Kwang-Cheol Lee ; Lee, Kwang-Cheol

  • Author_Institution
    Dept. of Mech. Eng., Pohang Univ. of Sci. & Technol., South Korea
  • fYear
    2003
  • fDate
    23-23 Jan. 2003
  • Firstpage
    558
  • Lastpage
    561
  • Abstract
    This paper describes a novel 3D fabrication method with single X-ray process utilizing a deep X-ray mask in which a micro-actuator is integrated. An X-ray absorber is electroplated on the shuttle mass driven by the integrated micro-actuator during deep X-ray exposures. 3D X-ray resist microstructures are revealed according to the in-depth dose distribution modulated by the shuttle mass motion and the resist development kinetics. Fabrication of two kinds of the X-ray exposure devices, electrostatically driven and electrothermally driven devices, and discussions on X-ray experiments are presented. S-shaped and conical shaped PMMA microstructures are fabricated with the devices.
  • Keywords
    LIGA; X-ray lithography; X-ray masks; microactuators; nanolithography; 3D X-ray resist microstructures; 3D fabrication; S-shaped PMMA microstructures; conical shaped PMMA microstructures; deep X-ray mask; electroplated; electrostatically driven devices; electrothermally driven devices; in-depth dose distribution modulated; integrated micro-actuator; resist development kinetics; shuttle mass; shuttle mass motion; Actuators; Electrothermal effects; Fabrication; Gold; Kinetic theory; Mechanical engineering; Microactuators; Microstructure; Resists; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
  • Conference_Location
    Kyoto, Japan
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7744-3
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2003.1189810
  • Filename
    1189810