DocumentCode :
3333959
Title :
Inductive output tube modeling and simulation code development
Author :
Wright, E.L. ; Nguyen, K.T. ; Pasour, J.A. ; Vlasov, A.N. ; Petillo, J.J. ; Kostas, C. ; Chernyavskiy, I.A. ; DeFord, J.F. ; Held, B.L. ; Ludeking, L.
Author_Institution :
Beam Wave Res., Inc., Bethesda, MD, USA
fYear :
2010
fDate :
20-24 June 2010
Firstpage :
1
Lastpage :
1
Abstract :
The inductive output tube (IOT) is the preferred technology for a number of applications requiring tens to hundreds of kilowatts of RF power at UHF and L-band frequencies and has been proposed for applications requiring as much as a megawatt CW. Although conceptually simple, modeling and simulation of the physics of the electron beam formation region within the IOT input cavity presents a significant challenge due to the disparate scales of the components. To address the needs of manufacturers of high-power IOTs and support the development of high-power Multiple-Beam (MB) IOT technology, our team is developing the tools necessary to allow end-to-end modeling and simulation, and design optimization, of the beam-wave interaction of these devices. The finite-element time-domain electrostatic PIC code MICHELLE [1], in conjunction with the Analyst® [2] suite of electromagnetic codes, are undergoing extensive modifications to provide modeling capability of the cathodegrid-anode structure that comprise the input cavity, while the beam wave interaction of the output cavity will be performed using the code TESLA [3]. The latest results of this effort will be shown.
Keywords :
finite element analysis; plasma devices; plasma simulation; MICHELLE code; TESLA code; beam-wave interaction; cathode-grid-anode structure; electron beam formation region; finite-element time-domain electrostatic PIC code; high-power multiple-beam; inductive output tube modeling; simulation code development; Design optimization; Electron beams; Electron tubes; Electrostatics; Finite element methods; L-band; Physics; Radio frequency; Time domain analysis; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
ISSN :
0730-9244
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2010.5534276
Filename :
5534276
Link To Document :
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