DocumentCode :
3333980
Title :
An in-situ end-point detector for parylene CVD deposition
Author :
Sutomo, Wongso ; Wang, Xuefeng ; Bullen, David ; Braden, Sarah K. ; Liu, Chang
Author_Institution :
Micro Actuators, Sensors & Syst. Group, Illinois Univ., Urbana, IL, USA
fYear :
2003
fDate :
19-23 Jan. 2003
Firstpage :
598
Lastpage :
601
Abstract :
We present the results of the development of an in situ end-point detector for a parylene chemical vapor deposition process. The detector is based on the thermal transfer principle and can be implemented on commercial parylene deposition systems with minimal system modification. Such a sensor enables a user to stop the deposition when a targeted thickness is reached. The end point detector is very simple to implement on existing parylene deposition systems. A series of such sensors with different target deposition thickness would allow extraction of the actual deposition rate within a deposition run.
Keywords :
chemical vapour deposition; dielectric thin films; micromachining; polymer films; process monitoring; thickness measurement; deposition rate extraction; detector implementation; in-situ end-point detector; parylene CVD deposition; parylene chemical vapor deposition process; sensor; system modification; target deposition thickness; thermal transfer principle; Chemical sensors; Chemical vapor deposition; Control systems; Detectors; Dielectric materials; Laboratories; Temperature sensors; Thermal conductivity; Thermal sensors; Thickness control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-7744-3
Type :
conf
DOI :
10.1109/MEMSYS.2003.1189820
Filename :
1189820
Link To Document :
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