DocumentCode :
3333988
Title :
Robust parylene-to-silicon mechanical anchoring
Author :
Liger, Matthieu ; Rodger, Damien C. ; Tai, Yu-Chong
Author_Institution :
Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA, USA
fYear :
2003
fDate :
19-23 Jan. 2003
Firstpage :
602
Lastpage :
605
Abstract :
This paper describes a new technique for strongly anchoring parylene (poly-para-xylylene) layers on a silicon substrate. Parylene has gained interest for MEMS applications due to its excellent properties. More specifically, because of its flexibility (Young´s modulus of 4 GPa), its chemical barrier properties, its conformal deposition and its biocompatibility, parylene is of great interest for microfluidics and BioMEMS. One of the issues with parylene processing is adhesion and delamination problems, occurring during fabrication or during device operation. Here, we report a new technique for anchoring parylene films on silicon using DRIE-etched trenches and anchors. We demonstrate a new way to completely protect the adhesion of parylene even when exposed to aggressive chemicals.
Keywords :
Young´s modulus; adhesion; conformal coatings; delamination; microfluidics; micromachining; micromechanical devices; plasma materials processing; polymer films; sputter etching; surface chemistry; DRIE-etched anchors; DRIE-etched trenches; MEMS applications; Si; Young´s modulus; adhesion; aggressive chemicals exposure; bioMEMS; biocompatibility; chemical barrier properties; conformal deposition; delamination; device operation; flexibility; microfluidics; parylene layers; parylene processing; parylene-to-silicon mechanical anchoring; poly-para-xylylene; silicon substrate; Adhesives; Chemicals; Delamination; Fabrication; Microfluidics; Micromechanical devices; Protection; Robustness; Semiconductor films; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-7744-3
Type :
conf
DOI :
10.1109/MEMSYS.2003.1189821
Filename :
1189821
Link To Document :
بازگشت