DocumentCode :
3334067
Title :
A novel thin chip scale packaging of the RF-MEMS devices using ultra thin silicon
Author :
Park, Yun-kwon ; Kim, Yong-Kook ; Kim, Hoon ; Lee, Duck-Jung ; Kim, Chul-Ju ; Ju, Byeong-Kwon ; Park, Jong-Oh
Author_Institution :
Korea Inst. of Sci. & Technol., Seoul, South Korea
fYear :
2003
fDate :
19-23 Jan. 2003
Firstpage :
618
Lastpage :
621
Abstract :
In this paper, as ultra thin silicon substrate was used as packaging substrate, we proposed ultra thin chip size RF-MEMS packaging technology that has vertical feed-through for low loss, as reduced the parasitic capacity. Thin silicon wafer with 50um thickness was fabricated to achieve short electric path, low loss and lightweight. And then via holes with the diameter of 60um were fabricated and was filled by the RIE and electroplating process. Also, the wafer level bumps were fabricated for simple, low cost, and fine patterning process. The measured S-parameter of packaged CPW(Co-planner waveguide) has the reflection loss of under -19 dB and the insertion loss of -0.54 to -0.67 dB.
Keywords :
electroplating; elemental semiconductors; micromechanical devices; packaging; silicon; sputter etching; substrates; -0.54 to -0.67 dB; -19 dB; RF-MEMS devices; S-parameter; Si; co-planner waveguide; electroplating process; fine patterning process; insertion loss; low loss; parasitic capacity; reflection loss; short electric path; thin chip scale packaging; ultra thin Si; vertical feed-through; wafer level bumps; Chemical technology; Chip scale packaging; Electronic packaging thermal management; Fabrication; Frequency; Insertion loss; Integrated circuit packaging; Micromechanical devices; Radiofrequency microelectromechanical systems; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-7744-3
Type :
conf
DOI :
10.1109/MEMSYS.2003.1189825
Filename :
1189825
Link To Document :
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