DocumentCode :
3334542
Title :
Influence of Bi³+ Doping on Photocatalytic Activity of TiO2 Film
Author :
Jiang Yanli ; Liu Yan ; Liu Ran ; Liu Jiayao ; Liu Huiling
Author_Institution :
Dept. of Environ. Eng., Harbin Inst. of Technol., Harbin, China
fYear :
2011
fDate :
10-12 May 2011
Firstpage :
1
Lastpage :
2
Abstract :
With the approach of anodic oxidation, TiO2/Ti film doped with Bi3+ was produced in H2SO4 electrolyte mixed with Bi(NO3)3·5H2O. The surface morphology were studied with scanning electron microscopy. The phase composition of the films was studied by X-ray diffraction The photocatalytic activity of the films was compared through the photocatalytic degradation rate of Rhodamine B. The relations of the photocatalytic activity to the concentration of Bi3+, the microstructure of the film were investigated. The results showed that Bi3+ increased the surface roughness and restrained the growth of crystal. In addition, the Rhodamine B was successfully photodegraded under UV illumination by Bi3+-TiO2/Ti film It was found that the highest degradation rate of rhodamine B was achieved through an optimal Bi3+ dosage of 0.6mol/L in Bi3+-TiO2/Ti film Compared with TiO2/Ti film, the recombination rate of e- and h+ of Bi3+-TiO2/Ti film was decreased.
Keywords :
X-ray diffraction; anodisation; bismuth; catalysis; doping; electrolytes; infrared spectra; mixing; photochemistry; scanning electron microscopy; surface morphology; surface roughness; thin films; titanium; titanium compounds; ultraviolet spectra; visible spectra; Bi3+ doping; H2SO4 electrolyte; TiO2-Ti film; TiO2-Ti:Bi; X-ray diffraction; anodic oxidation; microstructure; mixing; phase composition; photocatalytic activity; photocatalytic degradation; recombination rate; rhodamine B; scanning electron microscopy; surface morphology; surface roughness; ultraviolet illumination; Absorption; Degradation; Doping; Films; Oxidation; Rough surfaces; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bioinformatics and Biomedical Engineering, (iCBBE) 2011 5th International Conference on
Conference_Location :
Wuhan
ISSN :
2151-7614
Print_ISBN :
978-1-4244-5088-6
Type :
conf
DOI :
10.1109/icbbe.2011.5780911
Filename :
5780911
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3334542
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