DocumentCode
3335881
Title
First vertical PNP bipolar transistor structure on diamond
Author
Aleksov, A. ; Denisenko, A. ; Kohn, E.
Author_Institution
Dept. of Electron Devices & Circuits, Ulm Univ., Germany
fYear
1999
fDate
23-23 June 1999
Firstpage
58
Lastpage
59
Abstract
The application of nitrogen doped diamond in electronics is demonstrated by fabricating pnp bipolar transistors on diamond with nitrogen doped base for the first time. The transistor structures were fabricated by epitaxial growth on p-type diamond crystal substrate by using boron and nitrogen as the p- and n-dopants respectively, The electrical characteristics and numerical simulation of the transistors taking into account the deep donors are presented.
Keywords
bipolar transistors; diamond; semiconductor device measurement; semiconductor device models; semiconductor epitaxial layers; semiconductor growth; vapour phase epitaxial growth; C:N; electrical characteristics; epitaxial growth; numerical simulation; transistor structures; vertical PNP bipolar transistor; Bipolar transistors; Boron; Circuits; Electric breakdown; Electron devices; Material properties; Nitrogen; Semiconductor device breakdown; Temperature; Wide band gap semiconductors;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference Digest, 1999 57th Annual
Conference_Location
Santa Barbara, CA, USA
Print_ISBN
0-7803-5170-3
Type
conf
DOI
10.1109/DRC.1999.806322
Filename
806322
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