• DocumentCode
    3335881
  • Title

    First vertical PNP bipolar transistor structure on diamond

  • Author

    Aleksov, A. ; Denisenko, A. ; Kohn, E.

  • Author_Institution
    Dept. of Electron Devices & Circuits, Ulm Univ., Germany
  • fYear
    1999
  • fDate
    23-23 June 1999
  • Firstpage
    58
  • Lastpage
    59
  • Abstract
    The application of nitrogen doped diamond in electronics is demonstrated by fabricating pnp bipolar transistors on diamond with nitrogen doped base for the first time. The transistor structures were fabricated by epitaxial growth on p-type diamond crystal substrate by using boron and nitrogen as the p- and n-dopants respectively, The electrical characteristics and numerical simulation of the transistors taking into account the deep donors are presented.
  • Keywords
    bipolar transistors; diamond; semiconductor device measurement; semiconductor device models; semiconductor epitaxial layers; semiconductor growth; vapour phase epitaxial growth; C:N; electrical characteristics; epitaxial growth; numerical simulation; transistor structures; vertical PNP bipolar transistor; Bipolar transistors; Boron; Circuits; Electric breakdown; Electron devices; Material properties; Nitrogen; Semiconductor device breakdown; Temperature; Wide band gap semiconductors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference Digest, 1999 57th Annual
  • Conference_Location
    Santa Barbara, CA, USA
  • Print_ISBN
    0-7803-5170-3
  • Type

    conf

  • DOI
    10.1109/DRC.1999.806322
  • Filename
    806322