Title :
Diode laser absorption and emission spectroscopy of a streamer discharge in an atmospheric pressure plasma jet
Author :
Sands, B.L. ; Leiweke, R.J. ; Ganguly, B.N.
Author_Institution :
UES, Inc., Dayton, OH, USA
Abstract :
Research into atmospheric pressure plasma jets (APPJs) that are initiated via a self-sustaining streamer discharge has recently been driven by both their potential for applications to nonthermal material processing, and fundamental questions regarding the basic discharge mechanisms that drive this remarkably stable atmospheric pressure discharge. We have characterized a streamer-initiated atmospheric pressure plasma jet in a 5% Ar / 95% He carrier gas flowing into ambient air using tunable diode laser absorption spectroscopy together with photomultiplier-coupled optical emission spectroscopy and current/voltage measurements. Improvements in the stability of this APPJ have allowed us to isolate the streamer discharge component with a higher precision than we have previously reported, as the shot-to-shot jitter is now comparable to the optical detector bandwidths. This APPJ configuration is similar to that used in previous workl, with the difference that only a single ring electrode is used here. Optical transitions from He, Ar, and various air species were used to characterize the spatiotemporal evolution of the discharge. The optical detector was aligned with the output from an 811.53 nm tunable diode laser that was used to measure the line integrated density of the Ar ls5 metastable.
Keywords :
argon; discharges (electric); helium; plasma diagnostics; plasma instability; plasma jets; Ar-He; atmospheric pressure plasma jet stability; gas flow; line integrated density; nonthermal material processing; optical detector; optical transition; photomultiplier-coupled optical emission spectroscopy; self-sustaining streamer discharge; shot-to-shot jitter; single ring electrode; spatiotemporal evolution; stable atmospheric pressure discharge; tunable diode laser absorption spectroscopy; wavelength 811.53 nm; Absorption; Argon; Atmospheric-pressure plasmas; Diode lasers; Helium; Plasma applications; Plasma materials processing; Plasma stability; Spectroscopy; Tunable circuits and devices;
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2010.5534418