• DocumentCode
    3337573
  • Title

    Effects of metallic elements on thermoelectric properties of silicon borides

  • Author

    Mukaida, M. ; Kobayashi, K. ; Ueda, M. ; Tsunoda, T. ; Imai, Y.

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol., Ibaraki, Japan
  • fYear
    2002
  • fDate
    25-29 Aug. 2002
  • Firstpage
    138
  • Lastpage
    141
  • Abstract
    Silicon borides have excellent potential as high-temperature thermoelectric materials because of their high melting point and relatively large Seebeck coefficient. In the present work, effects of metallic elements on thermoelectric properties of the silicon borides were examined. The silicon borides containing some metallic elements were prepared by a plasma melting method. Silicon, boron and metallic elements powder were melted in a high-frequency induction plasma flame, and the silicon borides including metallic elements were formed. The crystal structures of the samples were characterized by X-ray diffraction (XRD), and the morphologies were observed by scanning electron microscope (SEM). Electrical properties such as Seebeck coefficient, electrical conductivity and Hall effect of the samples were measured. Seebeck coefficient of the boride reached about 400μVK-1, the electrical conductivity was above 100Sm-1. Because carrier mobility of the sample was less than about 1cm-2V-1 s-1 and increased with an increase of temperature, the conduction mechanism of silicon borides seems to be a polaron hopping. The effect of metallic elements was increasing Seebeck coefficient, and the carrier mobility of silicon borides decreased by adding metallic elements.
  • Keywords
    Hall effect; Seebeck effect; X-ray diffraction; carrier mobility; crystal structure; electrical conductivity; hopping conduction; materials preparation; melting; plasma materials processing; polarons; scanning electron microscopy; semiconductor materials; silicon compounds; thermoelectricity; Hall effect; SEM; Seebeck coefficient; X-ray diffraction; XRD; borides; carrier mobility; conduction mechanism; crystal morphology; crystal structure; electrical conductivity; high-frequency induction plasma flame; high-temperature thermoelectric materials; melting point; metallic element impurities; plasma melting method; polaron hopping; scanning electron microscopy; thermoelectric properties; Boron; Conductivity; Plasma materials processing; Plasma measurements; Plasma properties; Plasma x-ray sources; Powders; Scanning electron microscopy; Silicon; Thermoelectricity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermoelectrics, 2002. Proceedings ICT '02. Twenty-First International Conference on
  • Print_ISBN
    0-7803-7683-8
  • Type

    conf

  • DOI
    10.1109/ICT.2002.1190284
  • Filename
    1190284