DocumentCode
33402
Title
Mechanical Behavior and Anisotropy of Spin-Coated SU-8 Thin Films for MEMS
Author
Robin, C.J. ; Vishnoi, Akshay ; Jonnalagadda, Krishna N.
Author_Institution
Indian Inst. of Technol. Bombay, Mumbai, India
Volume
23
Issue
1
fYear
2014
fDate
Feb. 2014
Firstpage
168
Lastpage
180
Abstract
Spin-coated SU-8 thin films used in Microelectromechanical Systems (MEMS) devices are investigated using tensile experiments on freestanding microscale specimens to understand their mechanical response. Modified in situ optical microscope experiments are performed on 2 μm thick transparent SU-8 films in the strain rate range of 2×10-5/s to 2×10-2/s and accurate strain measurements are extracted using Digital Image Correlation. The effects of strain rate and anisotropy, on mechanical properties, in hard baked and non-hard baked films were studied in conjunction with Fourier Transform Infrared Spectroscopy. The Young´s modulus and tensile strength were found to increase with strain rate significantly, with the stress vs. strain behavior changing from viscoelastic to linear elastic. Hard baking of the films resulted in better mechanical properties, viz., elastic modulus and tensile strength, due to increased cross-linking density. The average moduli for hard baked and non-hard baked films were 3.48±0.57 GPa and 2.92± 0.43 GPa, respectively, obtained from 30 experiments each, over the entire strain rate range. Furthermore, the spin-coat process used to make the films developed anisotropy in the plane of the films due to molecular orientation, which was independent of hard baking temperature and duration.
Keywords
Fourier transform spectra; Young´s modulus; infrared spectra; micromechanical devices; optical microscopes; spin coating; stress-strain relations; tensile strength; thin films; Fourier transform infrared spectroscopy; MEMS; Young´s modulus; average moduli; cross-linking density; digital image correlation; elastic modulus; freestanding microscale specimens; hard baked films; hard baking temperature; linear elastic; mechanical behavior; mechanical property; microelectromechanical system devices; modified in situ optical microscope experiments; molecular orientation; nonhard baked films; size 2 mum; spin-coated SU-8 thin film anisotropy; strain behavior; strain measurements; strain rate effects; stress behavior; tensile experiments; tensile strength; transparent SU-8 films; viscoelastic; Adaptive optics; Anisotropic magnetoresistance; Optical imaging; Polymers; Strain; Stress; Anisotropy; SU-8; cross-linking; digital image correlation; strain-rate;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2013.2264341
Filename
6557423
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