DocumentCode
3340483
Title
Comparison of measurement techniques for advanced photomask metrology
Author
Smith, S. ; Tsiamis, A. ; McCallum, M. ; Hourd, A.C. ; Stevenson, J.T.M. ; Walton, A.J. ; Dixson, R.G. ; Allen, R.A. ; Potzick, J.E. ; Cresswell, M.W. ; Orji, N.G.
Author_Institution
Sch. of Eng. & Electron., Univ. of Edinburgh, Edinburgh
fYear
2008
fDate
24-27 March 2008
Firstpage
35
Lastpage
39
Abstract
This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
Keywords
atomic force microscopy; masks; advanced photomask metrology; critical dimension AFM; electrical measurements; measurement techniques; on-mask electrical probing; quartz photomask; Atomic measurements; Electric variables measurement; Electrical resistance measurement; Force measurement; Measurement techniques; Metrology; Proximity effect; Resistors; Scanning electron microscopy; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 2008. ICMTS 2008. IEEE International Conference on
Conference_Location
Edinburgh
Print_ISBN
978-1-4244-1800-8
Electronic_ISBN
978-1-4244-1801-5
Type
conf
DOI
10.1109/ICMTS.2008.4509311
Filename
4509311
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