• DocumentCode
    3340632
  • Title

    Spacing impact on MOSFET mismatch

  • Author

    Cathignol, A. ; Mennillo, S. ; Bordez, S. ; Vendrame, L. ; Ghibaudo, G.

  • Author_Institution
    STMicroelectronics, Crolles
  • fYear
    2008
  • fDate
    24-27 March 2008
  • Firstpage
    90
  • Lastpage
    95
  • Abstract
    Many test structures embedded in various technologies were measured to study the spacing impact on MOSFET mismatch. This impact is showed to highly depend on technology, device family, device type and bias conditions. The study of spatial correlation allows to properly model spacing impact on mismatch: this analysis -in this paper focused on MOSFETs- may be extended to any device. Finally, a worst case model that only requires standard matched pairs at minimum spacing is proposed to provide designers the maximum matching degradation that may affect spaced devices.
  • Keywords
    MOSFET; MOSFET mismatch; maximum matching degradation; spacing impact; spatial correlation; MOSFET circuits; Microelectronics; Testing; correlation; fluctuations; matching; mismatch; spacing; variability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 2008. ICMTS 2008. IEEE International Conference on
  • Conference_Location
    Edinburgh
  • Print_ISBN
    978-1-4244-1800-8
  • Electronic_ISBN
    978-1-4244-1801-5
  • Type

    conf

  • DOI
    10.1109/ICMTS.2008.4509320
  • Filename
    4509320