Title :
RIE-texturing of industrial multicrystalline silicon solar cells
Author :
Ruby, Douglas S. ; Zaidi, Saleem H. ; Narayanan, S. ; Bathey, Bala ; Yamanaka, Satoshi ; Balanga, Ruben
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Abstract :
We developed a maskless plasma texturing technique for multicrystalline Si (mc-Si) cells using reactive ion etching (RIE) that results in higher cell performance than that of standard untextured cells. Elimination of plasma damage has been achieved while keeping front reflectance to low levels. Internal quantum efficiencies higher than those on planar and wet-textured cells have been obtained, boosting cell currents and efficiencies by up to 6% on tricrystalline Si cells.
Keywords :
elemental semiconductors; semiconductor device measurement; silicon; solar cells; sputter etching; surface texture; RIE-texturing; Si; cell performance; front reflectance; internal quantum efficiency; maskless plasma texturing; multicrystalline silicon solar cells; reactive ion etching; Costs; Etching; Laboratories; Photovoltaic cells; Plasma applications; Plasma chemistry; Plasma waves; Reflectivity; Silicon; Surface texture;
Conference_Titel :
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
Print_ISBN :
0-7803-7471-1
DOI :
10.1109/PVSC.2002.1190477
