DocumentCode :
3341160
Title :
Improvement of excess-carrier lifetime in BaSi2 epitaxial films by post-growth annealing
Author :
Hara, Kosuke O. ; Usami, Noritaka ; Nakamura, Kentaro ; Takabe, Ryouta ; Baba, M. ; Toko, Kiyoshi ; Suemasu, Takashi
Author_Institution :
Grad. Sch. of Eng., Nagoya Univ., Nagoya, Japan
fYear :
2013
fDate :
16-21 June 2013
Abstract :
We have found that post-growth annealing of BaSi2 epitaxial films drastically modifies carrier-recombination kinetics. In fact, the 1/e decay time of excess carriers in 1640-nm-thick BaSi2 film annealed at 800 °C is 0.86 μs, which is much longer than that in the as-grown film (0.015 μs). Possible reason for the lifetime increase is discussed from the viewpoint of strain relaxation. The increased lifetime permits us to extract the minority-carrier lifetime from the injection-level dependence of apparent lifetime, which is up to 11 μs in the annealed films. This long lifetime confirms that earth-abundant BaSi2 is promising for thin-film solar cells.
Keywords :
annealing; barium compounds; carrier lifetime; epitaxial layers; minority carriers; solar cells; carrier-recombination kinetics; epitaxial film; excess-carrier lifetime improvement; injection-level dependence; minority-carrier lifetime; post-growth annealing; size 1640 nm; strain relaxation; temperature 800 degC; thin-film solar cell; Annealing; Charge carrier lifetime; Molecular beam epitaxial growth; Silicon; Strain; Substrates; barium compounds; charge carrier lifetime; epitaxial layers; semiconductor films; silicides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location :
Tampa, FL
Type :
conf
DOI :
10.1109/PVSC.2013.6744211
Filename :
6744211
Link To Document :
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