• DocumentCode
    3342106
  • Title

    Light induced degradation in Czochralski silicon during illuminated high temperature processing

  • Author

    Damiani, Ben ; Hilali, Mohamed ; Rohatgi, Ajeet

  • Author_Institution
    Univ. Center of Excellence for Photovoltaics; Res., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2002
  • fDate
    19-24 May 2002
  • Firstpage
    348
  • Lastpage
    351
  • Abstract
    Traditional Czochralski grown Si solar cells are known to suffer from light induced degradation (LID). The defect responsible for the LID is known to anneal out at temperatures above 200°C in the dark. This paper shows for the first time that bulk lifetime in boron doped Cz Si also degrades at 400°C and 600°C under lamp illumination in a belt furnace. In addition, both degradation and annealing mechanisms are shown to be active for the same RTP heating cycle at 200°C. As a result, a Cz Si sample can be annealed from 25i s to 44i s and degraded from a 180i s down to a 45i s effective lifetime. The bulk lifetime is fully recovered at temperatures above 300°C in the RTP and above 600°C in a belt furnace because defect annealing rate exceeds the defect formation rate. On the other hand bulk lifetime is annealed in a conventional furnace at temperatures above 200°C with no lamp illumination.
  • Keywords
    boron; elemental semiconductors; rapid thermal annealing; silicon; solar cells; 200 degC; 300 degC; 400 degC; 600 degC; Cz Si; Czochralski silicon; Si solar cells; Si:B; annealing; bulk lifetime; illuminated high temperature processing; lamp illumination; light induced degradation; Annealing; Belts; Boron; Degradation; Furnaces; Lamps; Lighting; Photovoltaic cells; Silicon; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
  • ISSN
    1060-8371
  • Print_ISBN
    0-7803-7471-1
  • Type

    conf

  • DOI
    10.1109/PVSC.2002.1190530
  • Filename
    1190530