DocumentCode
3342106
Title
Light induced degradation in Czochralski silicon during illuminated high temperature processing
Author
Damiani, Ben ; Hilali, Mohamed ; Rohatgi, Ajeet
Author_Institution
Univ. Center of Excellence for Photovoltaics; Res., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2002
fDate
19-24 May 2002
Firstpage
348
Lastpage
351
Abstract
Traditional Czochralski grown Si solar cells are known to suffer from light induced degradation (LID). The defect responsible for the LID is known to anneal out at temperatures above 200°C in the dark. This paper shows for the first time that bulk lifetime in boron doped Cz Si also degrades at 400°C and 600°C under lamp illumination in a belt furnace. In addition, both degradation and annealing mechanisms are shown to be active for the same RTP heating cycle at 200°C. As a result, a Cz Si sample can be annealed from 25i s to 44i s and degraded from a 180i s down to a 45i s effective lifetime. The bulk lifetime is fully recovered at temperatures above 300°C in the RTP and above 600°C in a belt furnace because defect annealing rate exceeds the defect formation rate. On the other hand bulk lifetime is annealed in a conventional furnace at temperatures above 200°C with no lamp illumination.
Keywords
boron; elemental semiconductors; rapid thermal annealing; silicon; solar cells; 200 degC; 300 degC; 400 degC; 600 degC; Cz Si; Czochralski silicon; Si solar cells; Si:B; annealing; bulk lifetime; illuminated high temperature processing; lamp illumination; light induced degradation; Annealing; Belts; Boron; Degradation; Furnaces; Lamps; Lighting; Photovoltaic cells; Silicon; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN
1060-8371
Print_ISBN
0-7803-7471-1
Type
conf
DOI
10.1109/PVSC.2002.1190530
Filename
1190530
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