• DocumentCode
    3343168
  • Title

    Type-II Ge/Si quantum dot superlattice for intermediate-band solar cell applications

  • Author

    Weiguo Hu ; Fauzi, Mohd Erman ; Igarashi, M. ; Higo, Akio ; Ming-Yi Lee ; Yiming Li ; Usami, Noritaka ; Samukawa, Seiji

  • Author_Institution
    Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Firstpage
    1021
  • Lastpage
    1023
  • Abstract
    A Ge/Si type-II quantum dot (QD) has been developed for use in all-Si intermediate-band solar cell (IBSC) applications. A top-down process is used to fabricate the ultra-high-quality QD superlattice. A newly developed 3D finite element method was used to solve several key design problems in achieving a practical structure. Theoretical calculations revealed that a heavy hole state can act as an ideal intermediate band when the interdot space ranges from 0.5 to 4 nm. An IBSC based on this superlattice dramatically enhanced conversion efficiency for concentration applications. For one-sun applications, H-passivizing Si and/or regrowthing amorphous SiC have a great potential to improve the conversion efficiency.
  • Keywords
    amorphous semiconductors; finite element analysis; germanium; quantum dots; semiconductor superlattices; silicon; solar cells; 3D finite element method; Ge-Si; IBSC; intermediate-band solar cell applications; quantum dot superlattice; ultra-high-quality QD superlattice; Finite element analysis; Nanotechnology; Photovoltaic cells; Quantum dots; Silicon; Superlattices; amorphous materials; photovoltaic cells; quantum dot; silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
  • Conference_Location
    Tampa, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.2013.6744314
  • Filename
    6744314