Title :
Interface properties of group III-nitrides and their importance for electronic devices
Abstract :
Electronic interface properties play an essential role for the performance of semiconductor devices. In this context the present short review discusses - mainly in connection with RF high mobility transistors (HEMTs) - aspects of surface morphology and growth conditions, electronic interface charges arising from bulk polarisation and suiface states, band offsets and Schottky barriers as well as surface passivation of group Ill-nitrides.
Keywords :
Aluminum gallium nitride; Epitaxial growth; Epitaxial layers; Gallium nitride; HEMTs; MODFETs; Molecular beam epitaxial growth; Nanoscale devices; Semiconductor devices; Surface morphology;
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
Conference_Location :
Smolenice Castle, Slovakia
Print_ISBN :
0-7803-8335-7
DOI :
10.1109/ASDAM.2004.1441177