High-performance insulator structures for accelerator applications

Author

Sampayan, S.E. ; Caporaso, G.J. ; Sanders, D.M. ; Stoddard, R.D. ; Trimble, D.O. ; Elizondo, J. ; Krogh, M.L. ; Wieskamp, T.F.

Author_Institution

Lawrence Livermore Nat. Lab., CA, USA

Volume

1

fYear

1997

fDate

12-16 May 1997

Firstpage

1308

Abstract

A new, high gradient insulator technology has been developed for accelerator systems. The concept involves the use of alternating layers of conductors and insulators with periods of order 1 mm or less. These structures perform many times better (about 1.5 to 4 times higher breakdown electric field) than conventional insulators in long pulse, short pulse, and alternating polarity applications. We describe our ongoing studies investigating the degradation of the breakdown electric field resulting from alternate fabrication techniques, the effect of gas pressure, the effect of the insulator-to-electrode interface gap spacing, and the performance of the insulator structure under bi-polar stress

Keywords

accelerator RF systems; composite insulators; laminates; accelerator applications; alternating polarity applications; bi-polar stress; breakdown electric field; high gradient insulator technology; high-performance insulator structures; insulator-to-electrode interface gap spacing; Degradation; Dielectric substrates; Dielectrics and electrical insulation; Electric breakdown; Electrons; Fabrication; Flashover; Gas insulation; Surface discharges; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 1997. Proceedings of the 1997

Conference_Location

Vancouver, BC

Print_ISBN

0-7803-4376-X

Type

conf

DOI

10.1109/PAC.1997.750009

Filename

750009