DocumentCode :
3344768
Title :
Structural modifications of InAs based materials for mid-infrared optoelectronic devices
Author :
Nohavica, D. ; Krier, A.
fYear :
2004
fDate :
17-21 Oct. 2004
Firstpage :
203
Lastpage :
206
Abstract :
Anisotropic and isotropic etchants are very useful in preparation of lnAs based devices, Polycarboxylic acids are very interesting as stroctural and selective etchants and Brrbased systems have been found to give good results for chemical polishing and etching of A3B5 semiconductors, We investigated both systems with a view towards applications in InAs based optoelectronic devices.
Keywords :
Anisotropic magnetoresistance; Chemicals; Gallium arsenide; Hafnium; Indium gallium arsenide; Optoelectronic devices; Physics; Resists; Sputter etching; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
Conference_Location :
Smolenice Castle, Slovakia
Print_ISBN :
0-7803-8335-7
Type :
conf
DOI :
10.1109/ASDAM.2004.1441195
Filename :
1441195
Link To Document :
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