• DocumentCode
    3345055
  • Title

    Extracting of silicon carbide schottky diode model parameters using lateral optimization method including the parallel conductance

  • Author

    Ouennoughi, Z. ; Weiss, R. ; Benlala, S. ; Ryssel, H.

  • fYear
    2004
  • fDate
    17-21 Oct. 2004
  • Firstpage
    271
  • Lastpage
    274
  • Abstract
    In this study, A nonlinear least squares optimization algorithm is used for extracting Silicon carbide Schottky parameters of the single model is presented Parameters values were extracted using this method from experimental characteristics collected .from Tungsten (W), Nickel (Nt) and Molybdenum (Mo) Schottky on 4H-SiC under forward and reverse bias and at different temperatures. The method is found to be reliable and accurate in situations where the model is a good approximation of Schottky diode performance. The diodes showed a barrier height of ϕb = 1.013eV for Mo and ϕb = 1.15 eV for Wand ϕb = 1.57 eV for Ni. The diodes showed also a series resistance in the range of 6 Ω to 15 Ω and a shunt conductance in the range of 10-12 S to 10-11 S The ideality factor is close to unity. Indications are given on the validity of the used technique and its main limitations.
  • Keywords
    Annealing; Nickel; Optimization methods; Oxidation; Rectifiers; Schottky barriers; Schottky diodes; Silicon carbide; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
  • Conference_Location
    Smolenice Castle, Slovakia
  • Print_ISBN
    0-7803-8335-7
  • Type

    conf

  • DOI
    10.1109/ASDAM.2004.1441213
  • Filename
    1441213