DocumentCode
3345055
Title
Extracting of silicon carbide schottky diode model parameters using lateral optimization method including the parallel conductance
Author
Ouennoughi, Z. ; Weiss, R. ; Benlala, S. ; Ryssel, H.
fYear
2004
fDate
17-21 Oct. 2004
Firstpage
271
Lastpage
274
Abstract
In this study, A nonlinear least squares optimization algorithm is used for extracting Silicon carbide Schottky parameters of the single model is presented Parameters values were extracted using this method from experimental characteristics collected .from Tungsten (W), Nickel (Nt) and Molybdenum (Mo) Schottky on 4H-SiC under forward and reverse bias and at different temperatures. The method is found to be reliable and accurate in situations where the model is a good approximation of Schottky diode performance. The diodes showed a barrier height of ϕb = 1.013eV for Mo and ϕb = 1.15 eV for Wand ϕb = 1.57 eV for Ni. The diodes showed also a series resistance in the range of 6 Ω to 15 Ω and a shunt conductance in the range of 10-12 S to 10-11 S The ideality factor is close to unity. Indications are given on the validity of the used technique and its main limitations.
Keywords
Annealing; Nickel; Optimization methods; Oxidation; Rectifiers; Schottky barriers; Schottky diodes; Silicon carbide; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
Conference_Location
Smolenice Castle, Slovakia
Print_ISBN
0-7803-8335-7
Type
conf
DOI
10.1109/ASDAM.2004.1441213
Filename
1441213
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