• DocumentCode
    3345632
  • Title

    Nanoindentation of single crystal and polycrystalline copper nanowires

  • Author

    Bansal, S. ; Toimil-Molares, E. ; Saxena, A. ; Tummala, Rao R.

  • Author_Institution
    Microsystems Packaging Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2005
  • fDate
    31 May-3 June 2005
  • Firstpage
    71
  • Abstract
    Metal nanowires are attracting considerable interest because of their potential importance to the technology of miniaturization of electronic devices in need of metallic contacts. One of the important attributes of nanowires is their potentially high mechanical strength. Nanoindentation is the most realistic tool at the present time to determine the mechanical properties of nanowires. The load-displacement behavior during nanoindentation of electrodeposited single crystal and 500 nm diameter polycrystalline copper nanowires was performed and the results are reported in this paper. The behavior has also been compared with that of bulk nanocrystalline and annealed copper. The hardness values for 50 nm grain size polycrystalline nanowires and those of extruded bulk 50 nm grain size copper were comparable, 2.1 GPa, and that of a 50 nm single crystal copper nanowire was 1.8 GPa.
  • Keywords
    electroplated coatings; grain size; hardness; indentation; integrated circuit metallisation; nanowires; 1.8 GPa; 2.1 GPa; 50 nm; 500 nm; Cu; load-displacement behavior; mechanical property; mechanical strength; metallic contacts; nanoindentation; nanowires; Copper; Crystalline materials; Fabrication; Gold; Grain size; Mechanical factors; Nanostructured materials; Nanowires; Plastics; Sensor arrays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2005. Proceedings. 55th
  • ISSN
    0569-5503
  • Print_ISBN
    0-7803-8907-7
  • Type

    conf

  • DOI
    10.1109/ECTC.2005.1441248
  • Filename
    1441248