DocumentCode
3345632
Title
Nanoindentation of single crystal and polycrystalline copper nanowires
Author
Bansal, S. ; Toimil-Molares, E. ; Saxena, A. ; Tummala, Rao R.
Author_Institution
Microsystems Packaging Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2005
fDate
31 May-3 June 2005
Firstpage
71
Abstract
Metal nanowires are attracting considerable interest because of their potential importance to the technology of miniaturization of electronic devices in need of metallic contacts. One of the important attributes of nanowires is their potentially high mechanical strength. Nanoindentation is the most realistic tool at the present time to determine the mechanical properties of nanowires. The load-displacement behavior during nanoindentation of electrodeposited single crystal and 500 nm diameter polycrystalline copper nanowires was performed and the results are reported in this paper. The behavior has also been compared with that of bulk nanocrystalline and annealed copper. The hardness values for 50 nm grain size polycrystalline nanowires and those of extruded bulk 50 nm grain size copper were comparable, 2.1 GPa, and that of a 50 nm single crystal copper nanowire was 1.8 GPa.
Keywords
electroplated coatings; grain size; hardness; indentation; integrated circuit metallisation; nanowires; 1.8 GPa; 2.1 GPa; 50 nm; 500 nm; Cu; load-displacement behavior; mechanical property; mechanical strength; metallic contacts; nanoindentation; nanowires; Copper; Crystalline materials; Fabrication; Gold; Grain size; Mechanical factors; Nanostructured materials; Nanowires; Plastics; Sensor arrays;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2005. Proceedings. 55th
ISSN
0569-5503
Print_ISBN
0-7803-8907-7
Type
conf
DOI
10.1109/ECTC.2005.1441248
Filename
1441248
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