Title :
Trends in power discrete devices
Author :
Baliga, B.Jayant
Author_Institution :
North Carolina State Univ., Raleigh, NC, USA
Abstract :
Over the last 10 years, revolutionary advances have occurred in power discrete devices which have spurred significant advances in the capability of power electronic systems. The introduction of power MOSFETs in the 1970s and the power IGBT in the 1980s enabled design of very compact, high efficiency systems due to the greatly enhanced power gain resulting from the high input impedance of these structures. Since then, research at PSRC on a variety of MOS-gated thyristors (DG-BRT, EST) has been conducted, resulting in some promising improvements in the trade-off between on-state power loss, switching power loss, and the forward biased safe-operating-area (FBSOA). Concurrent improvements in power rectifiers have been achieved at low voltage ratings using the TMBS structure, and at high voltage ratings using the MPS structure. On the longer term, silicon carbide Schottky rectifiers and power MOSFETs offer another 10-fold improvement in performance if technological and cost barriers can be overcome
Keywords :
MOS-controlled thyristors; Schottky diodes; electric impedance; insulated gate bipolar transistors; losses; power MOSFET; power bipolar transistors; power semiconductor diodes; power semiconductor switches; solid-state rectifiers; DG-BRT MOS-gated thyristors; EST MOS-gated thyristors; MOS-gated thyristors; MPS rectifier structure; SiC; TMBS rectifier structure; cost barriers; forward biased safe-operating-area; input impedance; on-state power loss; power IGBT; power MOSFETs; power discrete devices; power electronic systems; power gain; power rectifiers; silicon carbide Schottky rectifiers; silicon carbide power MOSFETs; switching power loss; voltage ratings; Anodes; Costs; Doping; Leakage current; MOSFETs; Power electronics; Rectifiers; Schottky barriers; Silicon carbide; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 1998. ISPSD 98. Proceedings of the 10th International Symposium on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4752-8
DOI :
10.1109/ISPSD.1998.702538