Influence of resistive wall impedance on the VSX light source

Author

Nakamura, N. ; Koseki, T.

Author_Institution

Inst. for Solid State Phys., Tokyo Univ., Japan

Volume

2

fYear

1997

fDate

12-16 May 1997

Firstpage

1756

Abstract

We describe the calculated resistive wall impedance of the vacuum chamber and the corresponding growth rate of coupled-bunch instabilities for the VSX light source, a Japanese third generation VUV and soft X-ray source with a beam energy of 2 GeV. The impedance calculation was performed for the normal Al vacuum duct and the SiC duct, a higher-order mode (HOM) absorber of the damped RF cavity. The impedance of the Al vacuum duct with a narrow vertical aperture is sufficiently high at low frequencies for exciting a transverse coupled-bunch instability. On the other hand, the SiC duct does not cause a serious problem about coupled-bunch instabilities and it gives only a small contribution to the broad-band impedance related to single-bunch instabilities

Keywords

electron accelerators; particle beam bunching; particle beam stability; storage rings; 2 GeV; Al; Al vacuum duct; SiC; SiC duct; VSX light source; broad-band impedance; coupled-bunch instabilities; damped RF cavity; higher-order mode absorber; impedance calculation; resistive wall impedance; single-bunch instabilities; transverse coupled-bunch instability; vacuum chamber; Conductivity; Ducts; Impedance; Light sources; Magnets; Maxwell equations; Permeability; Radio frequency; Silicon carbide; Skin;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 1997. Proceedings of the 1997

Conference_Location

Vancouver, BC

Print_ISBN

0-7803-4376-X

Type

conf

DOI

10.1109/PAC.1997.750997

Filename

750997