Influence of tip fields on NSOM imaging

Author

Bryant, G.W. ; Ansheng Liu

Author_Institution

Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA

fYear

1992

fDate

23-28 May 1992

Firstpage

136

Lastpage

137

Abstract

Summary form only given. Near-field scanning optical microscopy (NSOM) is being studied intensively to achieve optical spatial resolution much better than the diffraction limit. Modeling able to reproduce images and identify essential features in image formation is required. We describe several approaches that we have used, including the discrete dipole method and the multiple multipole method, to model scattering of nanometer-scale tip fields by nanometer-scale samples. NSOM images obtained from well-characterized experiments are simulated. Experimental and simulated images are compared to separate the contributions from tip-field structure, sample scattering, and mutual interaction and provide a clearer image interpretation.

Keywords

image resolution; light diffraction; light scattering; near-field scanning optical microscopy; optical images; NSOM; NSOM images; NSOM imaging; diffraction limit; discrete dipole method; image formation; image interpretation; multiple multipole method; nanometer-scale samples; nanometer-scale tip fields; near-field scanning optical microscopy; optical spatial resolution; sample scattering; simulated images; tip fields; tip-field structure; Chemistry; Diffraction; Electrostatic precipitators; Fluorescence; Focusing; Geometry; Lenses; Lighting; Microscopy; Physics;

fLanguage

English

Publisher

ieee

Conference_Titel

Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-576-X

Type

conf

DOI

10.1109/QELS.1999.807432

Filename

807432