DocumentCode
3348538
Title
2-photon 3-D lithography
Author
Perry, Joseph W.
Author_Institution
Dept. of Chem., Arizona Univ., Tucson, AZ, USA
fYear
1992
fDate
23-28 May 1992
Firstpage
137
Abstract
Summary form only given. Recent advances in the development of highly sensitive two-photon photoactive materials and their application in 3D lithographic microfabrication will be presented.
Keywords
micro-optics; optical fabrication; optical materials; photolithography; sensitivity; two-photon processes; 2-photon 3D lithography; 3D lithographic microfabrication; highly sensitive two-photon photoactive materials; Bleaching; Fluorescence; Laser mode locking; Lithography; Memory; Microscopy; Optical materials; Optical polymers; Optical sensors; Photobleaching;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-576-X
Type
conf
DOI
10.1109/QELS.1999.807433
Filename
807433
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