DocumentCode
3351243
Title
Second harmonic generation from Si/SiO/sub 2/: spectral and symmetry characteristics
Author
Wright, J.T. ; Cundiff, S.T. ; Evans-Lutterodt, K.W. ; Green, M.L.
Author_Institution
Joint Inst. for Lab. Astrophys., Nat. Inst. of Stand. & Technol., Boulder, CO, USA
fYear
1992
fDate
23-28 May 1992
Firstpage
246
Lastpage
247
Abstract
Summary form only given. Second harmonic generation (SHG) only occurs, in the dipole approximation, in material that is noninversion symmetric. Consequently, in material with bulk inversion symmetry, SHG only occurs near a surface or an interface that breaks the inversion symmetry. Substantial interest has been paid to SHG from the Si(100)-SiO/sub 2/ interface because of its importance to the semiconductor industry. Results showing that SHG is sensitive to roughness at this interface have only furthered interest. Roughness is becoming critical as MOSFET gate oxide thickness shrinks to nanometer scale with shrinking gate dimension.
Keywords
interface phenomena; optical harmonic generation; rough surfaces; silicon; silicon compounds; symmetry; MOSFET gate oxide thickness; SHG; Si(100)-SiO/sub 2/ interface; Si-SiO/sub 2/; Si/SiO/sub 2/; bulk inversion symmetry; dipole approximation; interfa; inversion symmetry; nanometer scale; noninversion symmetric; roughness; second harmonic generation; semiconductor industry; shrinking gate dimension; spectral characteristics; surface; symmetry characteristics; Free electron lasers; Frequency conversion; Gratings; Laser modes; Optical coupling; Optical harmonic generation; Optical surface waves; Polarization; Spectroscopy; Tunable circuits and devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-576-X
Type
conf
DOI
10.1109/QELS.1999.807624
Filename
807624
Link To Document