DocumentCode :
3351243
Title :
Second harmonic generation from Si/SiO/sub 2/: spectral and symmetry characteristics
Author :
Wright, J.T. ; Cundiff, S.T. ; Evans-Lutterodt, K.W. ; Green, M.L.
Author_Institution :
Joint Inst. for Lab. Astrophys., Nat. Inst. of Stand. & Technol., Boulder, CO, USA
fYear :
1992
fDate :
23-28 May 1992
Firstpage :
246
Lastpage :
247
Abstract :
Summary form only given. Second harmonic generation (SHG) only occurs, in the dipole approximation, in material that is noninversion symmetric. Consequently, in material with bulk inversion symmetry, SHG only occurs near a surface or an interface that breaks the inversion symmetry. Substantial interest has been paid to SHG from the Si(100)-SiO/sub 2/ interface because of its importance to the semiconductor industry. Results showing that SHG is sensitive to roughness at this interface have only furthered interest. Roughness is becoming critical as MOSFET gate oxide thickness shrinks to nanometer scale with shrinking gate dimension.
Keywords :
interface phenomena; optical harmonic generation; rough surfaces; silicon; silicon compounds; symmetry; MOSFET gate oxide thickness; SHG; Si(100)-SiO/sub 2/ interface; Si-SiO/sub 2/; Si/SiO/sub 2/; bulk inversion symmetry; dipole approximation; interfa; inversion symmetry; nanometer scale; noninversion symmetric; roughness; second harmonic generation; semiconductor industry; shrinking gate dimension; spectral characteristics; surface; symmetry characteristics; Free electron lasers; Frequency conversion; Gratings; Laser modes; Optical coupling; Optical harmonic generation; Optical surface waves; Polarization; Spectroscopy; Tunable circuits and devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-576-X
Type :
conf
DOI :
10.1109/QELS.1999.807624
Filename :
807624
Link To Document :
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