• DocumentCode
    3351792
  • Title

    Color pattern diffusion : Verification for wide baseline matching

  • Author

    Xinhai, Liu ; Wangming, Xu ; Kangling, Fang ; Jin, Wu

  • Author_Institution
    Eng. Res. Center of Metall. Autom. & Meas. Technol., Wuhan Univ. of Sci. & Technol., Wuhan
  • fYear
    2008
  • fDate
    21-24 Sept. 2008
  • Firstpage
    550
  • Lastpage
    553
  • Abstract
    After image retrieval based on wide baseline match, verification is required since there are still many false match pairs. The popular verification method, geometry, is limited for example in a weak match situation where the number of match pairs is less than enough. In order to improve retrieval results in such cases, this paper puts forward color pattern diffusion verification. Firstly, HSI Color moments in the original region where two corresponding SIFT feature points are detected are extracted from both the query image and the database image and then matched with each other. Secondly, color moments in both diffusion regions are extracted and matched as well. Finally, if the matching similarity of above color moments keeps invariant with color pattern diffusion in image space, the two interest points is taken as a real corresponding pair. Experiments demonstrated this approach works better with near real-time performance in many practical situations, especially in the weak match situation context.
  • Keywords
    image colour analysis; image matching; image retrieval; HSI Color moments; SIFT feature points; color pattern diffusion; database image; geometry; image retrieval; image verification; query image; wide baseline matching; Automation; Educational institutions; Educational technology; Geometry; Image databases; Image retrieval; Information retrieval; Information science; Pattern matching; Spatial databases; color pattern diffusion; image retrieval; verification; wide baseline matching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Cybernetics and Intelligent Systems, 2008 IEEE Conference on
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-1673-8
  • Electronic_ISBN
    978-1-4244-1674-5
  • Type

    conf

  • DOI
    10.1109/ICCIS.2008.4670904
  • Filename
    4670904