DocumentCode
3351944
Title
Tutorial on magnetic tunnel junction magnetoresistive random-access memory
Author
Cockburn, Bruce F.
Author_Institution
Dept. OF Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
fYear
2004
fDate
9-10 Aug. 2004
Firstpage
46
Lastpage
51
Abstract
Magnetic tunnel junction magnetoresistive random-access memory (MTJ-MRAM) appears to be in an advanced stage of development at several companies, including Motorola Inc., IBM Corporation, Infineon Technologies and Cypress Semiconductor Corp. MRAM has the potential to become a universal memory technology, with the high speed of SRAM, the nonvolatility of flash memory (but with much greater write-erase endurance than flash memory), and with storage densities that could approach those of DRAM. MRAM is embeddable in conventional CMOS processes with as few as four additional masks. We briefly review early MRAM technologies such as anisotropic MRAM, spin valve MRAM, and pseudo spin valve MRAM. Then we survey both conventional MTJ-MRAM and the recently-developed read-before-write toggle-mode MTJ-MRAM.
Keywords
magnetic storage; magnetic tunnelling; magnetoresistive devices; random-access storage; CMOS process; DRAM; MRAM technologies; MTJ-MRAM; SRAM; anisotropic MRAM; flash memory; magnetic tunnel junction; magnetoresistive random-access memory; pseudo spin valve MRAM; read-before-write toggle-mode; storage density; write-erase endurance; Anisotropic magnetoresistance; CMOS process; CMOS technology; Flash memory; Magnetic tunneling; Nonvolatile memory; Random access memory; Spin valves; Tunneling magnetoresistance; Tutorial;
fLanguage
English
Publisher
ieee
Conference_Titel
Memory Technology, Design and Testing, 2004. Records of the 2004 International Workshop on
ISSN
1087-4852
Print_ISBN
0-7695-2193-2
Type
conf
DOI
10.1109/MTDT.2004.1327983
Filename
1327983
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