• DocumentCode
    3351944
  • Title

    Tutorial on magnetic tunnel junction magnetoresistive random-access memory

  • Author

    Cockburn, Bruce F.

  • Author_Institution
    Dept. OF Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
  • fYear
    2004
  • fDate
    9-10 Aug. 2004
  • Firstpage
    46
  • Lastpage
    51
  • Abstract
    Magnetic tunnel junction magnetoresistive random-access memory (MTJ-MRAM) appears to be in an advanced stage of development at several companies, including Motorola Inc., IBM Corporation, Infineon Technologies and Cypress Semiconductor Corp. MRAM has the potential to become a universal memory technology, with the high speed of SRAM, the nonvolatility of flash memory (but with much greater write-erase endurance than flash memory), and with storage densities that could approach those of DRAM. MRAM is embeddable in conventional CMOS processes with as few as four additional masks. We briefly review early MRAM technologies such as anisotropic MRAM, spin valve MRAM, and pseudo spin valve MRAM. Then we survey both conventional MTJ-MRAM and the recently-developed read-before-write toggle-mode MTJ-MRAM.
  • Keywords
    magnetic storage; magnetic tunnelling; magnetoresistive devices; random-access storage; CMOS process; DRAM; MRAM technologies; MTJ-MRAM; SRAM; anisotropic MRAM; flash memory; magnetic tunnel junction; magnetoresistive random-access memory; pseudo spin valve MRAM; read-before-write toggle-mode; storage density; write-erase endurance; Anisotropic magnetoresistance; CMOS process; CMOS technology; Flash memory; Magnetic tunneling; Nonvolatile memory; Random access memory; Spin valves; Tunneling magnetoresistance; Tutorial;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Memory Technology, Design and Testing, 2004. Records of the 2004 International Workshop on
  • ISSN
    1087-4852
  • Print_ISBN
    0-7695-2193-2
  • Type

    conf

  • DOI
    10.1109/MTDT.2004.1327983
  • Filename
    1327983