DocumentCode :
3352545
Title :
Development of the yield enhancement system of a high-volume 8-inch wafer fab
Author :
Wang, Ping ; Chan, Mike ; Goodner, Ray ; Lee, Fourmun ; Ceton, Ron
Author_Institution :
MOS 12 Die Manuf., Motorola Inc., Chandler, AZ, USA
fYear :
1995
fDate :
17-19 Sep 1995
Firstpage :
51
Lastpage :
52
Abstract :
This presentation describes the development of a state-of-the-art, proactive yield enhancement system during the startup of Motorola´s latest high-volume 8-inch MOS 12 fab. The system has demonstrated rapid defect and failure analysis capability, resulting in fast problem identification and providing yield enhancement engineers with information for continuous yield improvement
Keywords :
failure analysis; integrated circuit yield; 8 inch; MOS 12; Motorola; defect analysis; failure analysis; high-volume wafer fab; yield enhancement system; Electron beams; Failure analysis; Floppy disks; Information analysis; Inspection; Ion beams; Probes; Scanning electron microscopy; Semiconductor device manufacture; Semiconductor device modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-2928-7
Type :
conf
DOI :
10.1109/ISSM.1995.524357
Filename :
524357
Link To Document :
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