Title :
Control of fine particulate and gaseous contaminants by UV/photoelectron method
Author :
Seto, Takafumi ; Yokoyama, Shin ; Okuyama, Kikuo ; Hirose, Masataka ; Fujii, Toshiaki ; Suzuki, Hidetomo
Author_Institution :
Dept. of Chem. Eng., Hiroshima Univ., Japan
Abstract :
In semiconductor manufacturing processes, surface contamination is a very important issue because it decreases the product yield of the LSI. In this study, a new method to remove fine airborne particles and gaseous contaminants in the wafer stocker using a UV/photoelectron method has been investigated. Two kinds of wafer stockers are used for investigating the efficiency of the UV/photoelectron method for controlling (1) particulate and gaseous contaminants under atmospheric conditions and (2) particulate contaminants under low pressure conditions
Keywords :
photoemission; semiconductor technology; surface contamination; LSI; UV/photoelectron method; atmospheric conditions; gaseous contaminants; low pressure conditions; particulate contaminants; product yield; semiconductor manufacturing; surface contamination control; wafer stocker; Chemical engineering; Control systems; Electrodes; Hydrocarbons; Lamps; Pollution measurement; Semiconductor diodes; Space technology; Surface contamination; Testing;
Conference_Titel :
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-2928-7
DOI :
10.1109/ISSM.1995.524360
