Title :
Carrierless systems for wet cleaning
Author :
Kitahara, S. ; Sugita, M.
Author_Institution :
Saga Plant, Tokyo Electron Kyushu Co. Ltd., Saga, Japan
Abstract :
In the initial development of carrierless handling systems for multi-bath wet cleaning processes in semiconductor manufacturing, it was difficult to establish damageless wafer transport. However, the efforts have now been rewarded through the many process advantages observed for such systems as compared to both carrier and half-cassette type methods. In this article the histories and current status of each of these wafer handling technologies are discussed
Keywords :
semiconductor technology; surface cleaning; carrier system; carrierless system; half-cassette system; multi-bath wet cleaning; semiconductor manufacturing; wafer transport; Chemical technology; Cleaning; Contamination; Control systems; Costs; Electrons; History; Process control; Production systems; Robots;
Conference_Titel :
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-2928-7
DOI :
10.1109/ISSM.1995.524377