DocumentCode :
3352770
Title :
Carrierless systems for wet cleaning
Author :
Kitahara, S. ; Sugita, M.
Author_Institution :
Saga Plant, Tokyo Electron Kyushu Co. Ltd., Saga, Japan
fYear :
1995
fDate :
17-19 Sep 1995
Firstpage :
142
Lastpage :
145
Abstract :
In the initial development of carrierless handling systems for multi-bath wet cleaning processes in semiconductor manufacturing, it was difficult to establish damageless wafer transport. However, the efforts have now been rewarded through the many process advantages observed for such systems as compared to both carrier and half-cassette type methods. In this article the histories and current status of each of these wafer handling technologies are discussed
Keywords :
semiconductor technology; surface cleaning; carrier system; carrierless system; half-cassette system; multi-bath wet cleaning; semiconductor manufacturing; wafer transport; Chemical technology; Cleaning; Contamination; Control systems; Costs; Electrons; History; Process control; Production systems; Robots;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-2928-7
Type :
conf
DOI :
10.1109/ISSM.1995.524377
Filename :
524377
Link To Document :
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