Title :
Contamination issues in gas delivery to a gate oxide process
Author :
Krishnan, Sowmya ; Laparra, Olivier ; Tudhope, Andrew
Author_Institution :
Ultra Clean Technol., Menlo Park, CA, USA
Abstract :
The contamination contributed by a conventional gas manifold and associated interconnects delivering process gases to a gate oxidation furnace was compared to that contributed by an ultraclean manifold. Additionally, the extent of corrosion by HCl on conventional and ultraclean tubing, welded using conventional and ultraclean welding techniques respectively, was investigated
Keywords :
corrosion; impurities; oxidation; semiconductor technology; surface contamination; HCl; contamination; corrosion; gas delivery system; gas manifold; gate oxidation furnace; interconnects; semiconductor manufacturing; tubing; ultraclean processing; welding; Chemical processes; Chemical technology; Furnaces; Gases; Impurities; Moisture; Oxidation; Surface contamination; Valves; Welding;
Conference_Titel :
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-2928-7
DOI :
10.1109/ISSM.1995.524378
