• DocumentCode
    3353721
  • Title

    A MOSFET-structured Si tip for stable emission current

  • Author

    Hirano, T. ; Kanemaru, S. ; Itoh, J.

  • Author_Institution
    Electrotech. Lab., Tsukuba, Japan
  • fYear
    1996
  • fDate
    8-11 Dec. 1996
  • Firstpage
    309
  • Lastpage
    312
  • Abstract
    A current-controllable Si field emitter tip with a metal-oxide-semiconductor field-effect transistor (MOSFET) structure is proposed and demonstrated. The device has a simple structure in which a conical Si tip is made in the drain region of a MOSFET. The gate performs two roles; one is that of a conventional extraction gate and the other is that of a control gate for the drain current supplied to the tip. Experimental results showed that the emission current was well controlled and stabilized by the drain current Stable emission of about 0.8 /spl mu/A was obtained with a single tip. An extension to multi-gate MOSFET structure is also mentioned.
  • Keywords
    MOSFET; electron field emission; elemental semiconductors; silicon; vacuum microelectronics; 0.8 muA; MOSFET structure; Si; conical Si field emitter tip; control gate; drain current; emission current; extraction gate; Etching; FETs; Fabrication; Insulation; Ion implantation; Laboratories; MOSFET circuits; Niobium; Sensor arrays; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1996. IEDM '96., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-3393-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1996.553591
  • Filename
    553591