DocumentCode
3353799
Title
A 2 Hz, laboratory scale plasma focus device using a multichannel pseudospark switch
Author
Bergmann, K. ; Kiefer, J. ; Neff, W. ; Lebert, R. ; Gavrilescu, C.
Author_Institution
Fraunhofer-Inst. fur Lasertechnik, Aachen, Germany
Volume
2
fYear
1997
fDate
June 29 1997-July 2 1997
Firstpage
929
Abstract
A small, repetitive plasma focus device using a low erosion multichannel pseudospark switch is presented. This device showed negligible wear after more than 200,000 pulses with peak currents exceeding 200 kA and repetition rates up to 2 Hz. The plasma focus discharge can be driven using different gases leading to different characteristics in the X-ray emission. This allows the matching of the source to special demands of the application with respect to, e.g., the bandwidth or the required wavelength interval. First experiments concerning the soft X-ray emission of neon and argon are discussed. Examples for different applications (proximity lithography, fluorescence analysis) using pinch plasmas presented.
Keywords
plasma focus; power supplies to apparatus; pulse generators; pulsed power switches; 2 Hz; 200 kA; X-ray emission; fluorescence analysis; multichannel pseudospark switch; peak currents; plasma focus device; plasma focus discharge; proximity lithography; repetition rates; Fault location; Gases; Laboratories; Plasma applications; Plasma devices; Plasma properties; Plasma sources; Plasma waves; Plasma x-ray sources; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Conference, 1997. Digest of Technical Papers. 1997 11th IEEE International
Conference_Location
Baltimore, MA, USA
Print_ISBN
0-7803-4213-5
Type
conf
DOI
10.1109/PPC.1997.674512
Filename
674512
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