DocumentCode :
3354340
Title :
Leveraging a low pressure thermal module to meet the challenges of advanced device manufacturing
Author :
Peuse, Bruce ; Pfarr, Mike ; Timans, Paul ; Hu, Yaozhi
Author_Institution :
Mattson Technol., Fremont, CA
fYear :
2004
fDate :
2004
Firstpage :
61
Lastpage :
72
Abstract :
Fulfilling the needs of advanced semiconductor device manufacturing presents continued challenges to the developers and manufacturers of capital equipment. More than twenty years of RTP equipment evolution and development has resulted in the availability of a select few technologies that are capable of delivering the demanding performance required to manufacturer today´s advanced semiconductor devices. This paper describes the development and characterization of a new low pressure RTP process module that was developed to fulfil some specific needs. With the use of proven existing thermal processing technology, the design, development, characterization and qualification of this module for device manufacturing was done in a very short period of time
Keywords :
rapid thermal annealing; semiconductor device manufacture; semiconductor technology; RTP equipment; advanced device manufacturing; advanced semiconductor device manufacturing; low pressure thermal module; thermal processing technology; Annealing; Dielectric films; Dielectric thin films; Heating; Lamps; Manufacturing; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor devices; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. 12th IEEE International Conference on
Conference_Location :
Portland, OR
Print_ISBN :
0-7803-8477-6
Type :
conf
DOI :
10.1109/RTP.2004.1441938
Filename :
1441938
Link To Document :
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